20nm Design - How this Advanced Technology Node Will Transform SoCs and EDA

August 24, 2011 // By Cadence
A number of manufacturing issues specific to 20nm pose a challenge to developing high-quality silicon and SoCs on time and on budget. Such an advanced node requires a holistic approach. This approach, coupled with new lithography techniques and in-design DFM technologies, provides the most practical and predictable path to 20nm silicon. Read this paper to learn more about the opportunities and challenges associated with 20nm design.
Company: 
Cadence, 20 nm design