20nm Design - How this Advanced Technology Node Will Transform SoCs and EDA

August 24, 2011 // By Cadence
A number of manufacturing issues specific to 20nm pose a challenge to developing high-quality silicon and SoCs on time and on budget. Such an advanced node requires a holistic approach. This approach, coupled with new lithography techniques and in-design DFM technologies, provides the most practical and predictable path to 20nm silicon. Read this paper to learn more about the opportunities and challenges associated with 20nm design.
Cadence, 20 nm design