3D tool aims at 28nm for MEMS and new structures

April 10, 2012 // By Nick Flaherty
Design tool developer Coventor is aiming at the process and integration challenges of 28nm and beyond with the latest version of its 3D software.

Already used widely for designing micromachined (MEMS) systems and memory structures, the technology is increasingly important for building 3D transistor structures at leading edge geometries.
SEMulator3D 2012 adds 64bit support and increased capacity, speed and automation advancements to accelerate development of leading-edge process technology nodes.
The 2012 release provides full support for 64-bit operating systems and 3D visualization speed improvements that make it possible to model devices in finer detail, down to the sub-nanometer level, and work with larger areas on the die. In addition, the assignment of boundary conditions for all process steps is now fully automated by the software. These new capabilities remove barriers to adopting virtual fabrication for advanced process development and significantly improve the productivity of existing users.
“Semiconductor process technology has entered an era where geometric scaling alone is not sufficient to keep up with the front-end technology roadmap,” according to Mike Jamiolkowski, CEO of Coventor. “SEMulator3D has proven that it can help compress the technology development timeline and provide a rapid return on investment.”
SEMulator3D virtual fabrication is quite distinct from conventional TCAD simulation software: it has the capacity and speed to model the complete front-end fabrication sequence rather than a few steps at a time. In addition, SEMulator3D has the flexibility to accurately model any device type and is fast enough to model all possible device variations, enabling users to predict process defect modes and reduce the number of scrap wafers.
The software has been successfully deployed by semiconductor companies for process integration of advanced logic and memory technology nodes, including 22nm logic, and is now being applied to accelerate development of the upcoming 14nm and 10nm nodes. It is also used by leading MEMS integrated device manufacturers (IDMs) and MEMS foundries for process development and design verification prior to tape out. Emerging applications for SEMulator3D include design rule development, failure analysis, and metrology.