Aselta Nanographics and NuFlare partner on complex 20-nm photomasks

September 13, 2012 // By Julien Happich
Aselta Module leverages the NuFlare EBM-8000 System dose modulation control in order to give users the best combination of resolution and reduced writing time of 20-nm photomasks.

Aselta supplies advanced dataprep software solutions and NuFlare Technology is a provider of electron beam mask writing systems. Their partnership is aimed at streamlining the dataflow between Aselta dataprep software solution and the NuFlare EBM-8000 mask writing system. A new Aselta module will generate and optimize the mask data for the recently available external control of dose modulation in NuFlare machines. This capability is enabled through NuFlare new VSB12i input format which Aselta now supports. Aselta supports as well NuFlare VSB12 input format, previously available.

NuFlare also announced that the seven dose levels per variable-shaped beam shot will also become availble for the EBM-7000 as an optional upgrade. Therefore Inscale full benefit will also be available for EBM-7000 systems in the future. Aselta data prep software, Inscale, proposes a unique trade-off between pattern fidelity and writing time, allowing customers to reduce their costs while augmenting quality. The challenge of writing advanced 20nm photomasks is to find the reasonable trade-off between mask pattern fidelity which drives wafer yield and writing time which drives mask cost. By using NuFlare seven dose levels per variable-shaped beam shot, Inscale will maximize the benefits for the users.

Inscale will also allow some benefit for the previous NuFlare systems not having access to external dose modulation. Inscale does concurrently the fracturing steps, the dose assignment and the geometry optimization. By lowering the overall exposure dose and compensating by geometry optimization combined with improved smart shot fracturing, Inscale will help reducing writing time for previous generation NuFlare systems.

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