TSMC selects Cadence Virtuoso and Encounter platforms for its 20-nm design infrastructure

October 16, 2012 // By Paul Buckley
TSMC has selected Cadence solutions for the company’s 20-nm design infrastructure. The solutions cover the Virtuoso custom/analog and Encounter RTL-to-signoff platforms.

The TSMC 20-nm reference flows incorporate new features and methodologies in both Encounter and Virtuoso that take into account newly important wire characteristics, timing closure and design size considerations.

For the custom/analog designer, Virtuoso technology supports new 20-nanometer constraints in the industry standard OpenAccess database, including G0 rules, interactive coloring for color-aware layout, a constraint-driven pre-coloring flow, odd-cycle loop prevention and detection, advanced Pcell abutment and support for local interconnect layers. Cadence Integrated Physical Verification System is an in-design technology that integrates the Cadence Physical Verification System within the Virtuoso platform.

For the digital designer, Encounter RTL-to-GDSII supports 20-nm rules, the new FlexColor double- patterning technology for correct-by-construction placement and routing, and Encounter RTL Compiler plus the GigaOpt optimization of Encounter Digital Implementation (EDI) System for better quality of results with a shorter turnaround time.

For signoff, the Cadence Encounter Timing System offers advanced waveform modeling and multi-valued SPEF for double-patterning RC extraction. Cadence QRC Extraction delivers a DPT-aware corners extraction technology that supports both LEF/DEF and GDSII flows. The Cadence Physical Verification System offers support of 20-nanometer double-patterning and incremental DRC correction, and TSMC rule decks are now available for the Physical Verification System. Encounter Power System provides accurate, basic and complex topology-dependent EM rules, and Litho Physical Analyzer and Litho Electrical Analyzer have been updated with 20-nm models for hotspot analysis and repair.

Finally, TSMC has adopted Cadence technology for its Custom Design Reference Flow, which demonstrates a methodology for designing custom and digitally assisted analog circuits through common technology setup and integrated concurrent analog and digital layout.

“Cadence is focused on providing our customers with the technologies they need to tackle the biggest challenges with today’s complex designs, such as low power consumption,” said Dr. Chi-Ping Hsu, senior vice president of the Silicon Realization Group at Cadence. “We have been working closely with TSMC and our mutual customers to develop comprehensive solutions to the challenges of 20-nanometer